Monolithic Fabrication of Flexible Film and Thinned Integrated Circuits (特集:MEMS技術)

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概要

• 論文の詳細を見る

• A new monolithic device technology for micromachines has been developed. This device consists of a flexible film and thinned integrated circuits. The fabrication process is compatible with high performance CMOS devices. The flexible film includes high density wires and other electric functions in several micrometers thick. The integrated circuits are thinned by electrochemical etching to less than 20μm thick. This device is useful for integration and size reduction of electric components for micromachines. We have fabricated the monolithic devices and investigated the characteristics.

• 社団法人 電気学会の論文

著者

• Ota Ryo

  Olympus Optical Co. Ltd.

• Ota Ryo

  Olympus Corporation

• Yanagisawa K

  Microsystems Group Research Department Olympus Optical Co. Ltd.

• Yanagisawa Kazuhisa

  Olympus Optical Co. Ltd.

• KANEKO Shinji

  Olympus Optical Co.,Ltd.

• ASAOKA Nobuyoshi

  Olympus Optical Co.,Ltd.

• TOSAKA Hiroshi

  Olympus Optical Co.,Ltd.

• Tosaka Hiroshi

  Olympus Optical Co. Ltd.

• Asaoka Nobuyoshi

  Olympus Optical Co. Ltd.

• Kaneko Shinji

  Olympus Optical Co. Ltd.

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