REACTIVE ION BEAM ETCHING (RIBE) TECHNIQUE FOR CROSS SECTIONAL SEM SPECIMEN PREPARATION OF SEMICONDUCTORS

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概要

• 論文の詳細を見る
• 1999-05-01

著者

• ALANI R.

  Gatan Inc.

• Alani R.

  Gatan R&d

• MITRO R.J.

  Gatan R & D

• OGURA K.

  JEOL Ltd.

• Mitro R.j.

  Gatan Inc.

• Mitro R.j.

  Gatan R&d

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• PREPARATION OF SEM SPECIMENS BY ION BEAM ETCHING FOR ENHANCED CHANNELING AND ORIENTATION IMAGING
• REACTIVE ION BEAM ETCHING (RIBE) TECHNIQUE FOR CROSS SECTIONAL SEM SPECIMEN PREPARATION OF SEMICONDUCTORS

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