Pattern-Dependent Charging and the Role of Electron Tunneling
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1998-04-01
著者
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Giapis K
Division Of Chemistry And Chemical Engineering California Institute Of Technology
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Giapis Konstantinos
Division Of Chemistry And Chemical Engineering California Institute Of Technology
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Hwang G
Division Of Chemistry And Chemical Engineering California Institute Of Technology
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Hwang Gyeong
Division Of Chemistry And Chemical Engineering California Institute Of Technology
関連論文
- Mechanism of Charging Reduction in Pulsed Plasma Etching
- Pattern-Dependent Charging and the Role of Electron Tunneling