Analytical Characteristics of Inductively Coupled Oxygen-Plasma Mass Spectrometry Assisted by Adding Argon to the Outer Gas

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概要

• 論文の詳細を見る
• Japan Society for Analytical Chemistryの論文
• 1997-06-10

著者

• UCHIDA Hiroshi

  Kanagawa Industrial Research Institute

• ITO Tetsumasa

  Seiko Instruments Inc.

関連論文

• Determination of Trace Impurities on Silicon-Wafer Surface by Isotope Dilution Analysis Using Electrothermal Vaporization/Inductively Coupled Plasma Mass Spectrometry
• Analytical Characteristics of Inductively Coupled Oxygen-Plasma Mass Spectrometry Assisted by Adding Argon to the Outer Gas

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