An End-point Detector for Planarization of Semiconductor Devices by Chemical Mechanical Polishing

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概要

• 論文の詳細を見る
• 1996-03-31

著者

• Honma Yoshio

  Central Research Laboratory Hitachi Ltd.

• MORIYAMA Shigeo

  Central Research Laboratory, Hitachi Ltd.

• Yasui Kan

  Central Research Laboratory Hitachi Ltd.

• Moriyama Shigeo

  Central Research Laboratory Hitachi Ltd.

• Yamaguchi Katsuhiko

  Central Research Laboratory Hitachi Ltd.

関連論文

• Overlay Error Estimation of Wafer Rear Surface Alignment for 0.1-μm Lithography
• Low Permittivity Organic Dielectrics for Multilevel Interconnection in High Speed ULSIs
• Mechanically Ruled Stigmatic Concave Gratings : Diffiraction Gratings
• An End-point Detector for Planarization of Semiconductor Devices by Chemical Mechanical Polishing

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