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United Microelectronics Corp. Hsin‐chu Twn | 論文

• The C-R Method Used for Leff Extraction and Process Optimization in Nano N/P-MOSFET's Devices
• The C-R Method Used for Leff Extraction and Process Optimization in Nano N/P-MOSFET's Devices
• Highly Reliable Liquid-Phase-Deposited SiO_2 with Nitrous Oxide Plasma Post-Treatment for Low-Temperature-Processed Polysilicon Thin Film Transistors

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