スポンサーリンク
Ulsi Laboratory Mitsubishi Electric Corporation:(present Address) Department Of Electrical Engineeri | 論文
- Wetting Behavior of Liquid on Geometrical Rough Surface Formed by Photolithography
- Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
- Blister Formation at Photoresist-Substrate Interface
- Local Peeling of Photoresist Film during Ultraviolet Light Exposure
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
- Wetting Failure of Photoresist on Spin-On-Glass (SOG) Substrate by Spin Coating