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The Graduate School At Nagatsuta Tokyo Institute Of Technology | 論文
- Mechanical Property of Dissimilar Material Nanocomposites Prepared by Ion Beam Assisted Sputtering Process(Physics, Processes, Instruments & Measurements)
- 位相共役光とその計測への応用
- 適応的光学系 (光情報処理--画像と光コンピュ-タ)
- 光の制御 (光と計測制御)
- 最近の超音波映像系における信号処理 (超音波検査における信号処理特集)
- 特殊情報処理を用いた超音波映像系
- Optimization of Transparent Conductive Oxide for Improved Resistance to Reactive and/or High Temperature Optoelectronic Device Processing
- Control of Orientation for Polycrystalline Silicon Thin Films Fabricated from Fluorinated Source Gas by Microwave Plasma Enhanced Chemical Vapor Deposition
- シリコンナノ結晶のCVD成長と新機能 (特集 ナノ結晶の成長と新機能)
- Stabilization of Oxygen Diffusion in Ga-Doped YBa_2Cu_3O_ Thin Films Observed by Spectroscopic Ellipsometry
- Reproducible Growth of Metalorganic Chemical Vapor Deposition Derived YBa_2Cu_3O_x Thin Films Using Ultrasonic Gas Concentration Analyzer
- In Situ Growth Monitoring During Metalorganic Chemical Vapor Deposition of YBa_2Cu_3O_x Thin Films by Spectroscopic Ellipsometry
- TFTとその応用
- アモルファスシリコンを用いた薄膜トランジスタとその集積回路
- Efficient Electrochemical Reduction of N_2 to NH_3 Catalyzed by Lithium
- Hydrogenation of Solid State Carbonates
- シリコンナノ結晶のCVD成長と新機能(ナノ結晶の成長と新機能)
- Fabrication of Polycrystalline Silicon Films from SiF_4/H_2/SiH_4 Gas Mixture Using Very High Frequency Plasma Enhanced Chemical Vapor Deposition with In Situ Plasma Diagnostics and Their Structural Properties.
- Comparison of Microstructure and Crystal Structure of Polycrystalline Silicon Exhibiting Varied Textures Fabricated by Microwave and Very High Frequency Plasma Enhanced Chemical Vapor Deposition and Their Transport Properties
- Optimum Ultrasonic Imagine System Using ARMA Processing : Medical Ultrasonics