スポンサーリンク
Technology Platform Research Center, SEIKO EPSON Corporation, 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano 399-0293, Japan | 論文
- High-Performance Polycrystalline Silicon Thin-Film Transistors with Low Trap Density at the Gate-SiO2/Si Interface Fabricated by Low-Temperature Process
- Effects of Capping Layer on Grain Growth with $\mu$-Czochralski Process during Excimer Laser Crystallization