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State Key Lab on Integrated Optoelectronics, Dept. of Electronic Engineering, Tsinghua University | 論文
- Characteristics of n-GaN After Cl_2/Ar and Cl_2/N_2 Inductively Coupled Plasma Etching
- Highly Selective Dry Etching of GaN over AlGaN Using Inductively Coupled C1_2/N_2/0_2 Plasmas