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Semiconductor Technology Laboratory, Oki Electric Industry Co., Ltd, | 論文
- Characteristics of AlGaAs/AlGaAs Interface Regrown Using In-Situ Low-Termperature H_2 Annealing in Metalorganic Vapor Phase Epitaxy
- Characteristics of AlGaAs/AlGaAs Interface after In-Situ Low-Temperature H_2 Annealing and MOVPE Regrowth