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Semiconductor Process and Device Lab,, Dept. of Electronic Engineering, Chung-Ang Univ. | 論文

• Development of New Etching Algorithm for Ultra Large Scale Integrated Circuit and Application of ICP (Inductive Coupled Plasma) Etcher
• Development of New Etching Algorithm for Ultra Large Scale Integrated Circuit and Application of ICP (Inductive Coupled Plasma) Etcher
• Development of New Etching Algorithm for Ultra Large Scale Integrated Circuit and Application of ICP (Inductive Coupled Plasma) Etcher
• Ultra-Low Energy Ion Implant Profile Prediction for sub 0.1μm Technologies
• Ultra-Low Energy Ion Implant Profile Prediction for sub 0.1μm Technologies
• Ultra-Low Energy Ion Implant Profile Prediction for sub 0.1μm Technologies

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