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Semiconductor Design and Development Center, Hitachi, Ltd. | 論文
- High-Quality Carbon-Doped Boron Nitride Membrane for X-Ray Lithography Mask
- Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation : Lithography Technology
- Minimization of X-Ray Mask Distortion by Two-Dimensional Finite Element Method Simulation