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SNDL, ECE Dept, National University of Singapore | 論文
- Practical Solutions to Enhance EWF Tunability of Ni FUSI Gates on HfO_2
- Highly Manufacturable CMOSFETs with Single High-k (HfLaO) and Dual Metal Gate Integration Process
- A Novel Dual-Metal Gate Integration Process for Sub-1nm EOT HfO_2 CMOS Devices