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Research Laboratory, OKI Electric Industry Co. Lid. | 論文
- Preparation of a-Si:H/a-Si_C_x:H Superlattices
- Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
- Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
- Two Components of Light-Induced Photoconductivity Decays in a-Si:H
- Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
- Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method