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Research Institute Of Electronics Shizuoka University:(present Address) Micron Technology | 論文
- Deposition of Aluminum Nitride by Remote Plasma-Enhanced Chemical Vapor Deposition Using Triisobutyle Aluminum
- Thin Film Deposition in the Afterglows of N_2 and H_2 Microwave Plasmas
- The Role of Hydrogen Atoms in Afterglow Deposition of Silicon Thin Films