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Process development Division C850 FUJITSU LIMITED | 論文
- New Cleaning Solution ; Mixture of HF/HCl and Pure Water Containing a Little Dissolved Oxygen
- Characterization of Cleaning Technology for Silicon Surfaces by Hot Pure Water Containing Little Dissolved Oxygen
- Thickness-Deconvolved Structural Properties of Thermally Grown Silicon Dioxide Film
- Characterization of a Cleaning Technology for Silicon Surface by Hot Pure Water Containing a Little Dissolved Oxygen
- In-Situ Observation of Oxygen Exposed Hydrogen Terminated Silicon Surfaces
- Effects of Dissolved Oxygen in HF Solutiom on Silicon Surface Morphology