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Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies(ASET) | 論文
- Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
- Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma
- In-situ Time-Resolved Infrared Spectroscopic Study of Silicon-Oxide Surface during Selective Etching over Silicon in Fluorocarbon Plasma