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National University of Kaohsiung | 論文
- Thermal Flow and Chemical Shrink Techniques for Sub-100 nm Contact Hole Fabrication in Electron Beam Lithography
- Reduction Substrate Alkaline Contamination by Utilizing Multi-Layer Bottom Antireflective Coating Structures in ArF Lithography
- Privatization, Efficiency Gap, and Subsidization with Excess Taxation Burden
- Stress-Induced Capacitance of Partially Depleted MOSFETs from Ring Oscillator Delay