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National Nano Device Laboratories, Hsinchu 300, Taiwan, R.O.C. | 論文
- Plasma Treatment and Dry Etch Characteristics of Organic Low-k Dielectrics
- Far-Infrared Resonance in Split Ring Resonators
- Characteristics of the Inter-Poly Al2O3 Dielectrics on NH3-Nitrided Bottom Poly-Si for Next-Generation Flash Memories
- Optical Nonlinearity and Ultrafast-Carrier Dynamics of a Strained Quantum-Well Saturable Bragg Reflector
- Degradation of Low-Frequency Noise in Partially Depleted Silicon-on-Insulator Metal Oxide Semiconductor Field-Effect Transistors by Hot-Carrier Stress
- Characterization of Hydrogen-Treated Pentacene Organic Thin Film Transistors
- Fabrication of Silicon and Germanium Nanostructures by Combination of Hydrogen Plasma Dry Etching and VLS Mechanism