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National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn | 論文
- Relationship between crystal structure and superconductivity in LnFeAsO1-y (Ln = lanthanide) (Proceedings of the international symposium on Fe-pnictide superconductors)
- Interpretation of Abnormal AC Loss Peak Based on Vortex-Molecule Model for a Multicomponent Cuprate Superconductor
- Electrical Pulse Generation from Mimosa pudica by Administering Other Plant Extracts
- ニューサンシャイン計画における石炭転換技術研究開発
- Electronic Structure of the Organic Superconductor k-(BEDT-TTF)_2Cu(NCS)_2 Studied by Angle-Resolved Photoemission Spectroscopy
- Scanning Tunneling Microscopy Study on c(6x2) Structure of Ag/Si(001)
- Nature of Tip-Sample Interaction in Dynamic Mode Atomic Force Microscopy
- Tip-Induced Surface Disorder on Hydrogen-Terminated Silicon(111) Surface Observed by Ultrahigh-Vacuum Atomic Force Microscopy
- Observation of Hydrogen-Terminated Silicon (111) Surface by Ultrahigh-Vacuum Atomic Force Microscopy
- Amyloid Formation of Tyrosine-Mutant Amyloid-β(1-42)
- Effect of Peptide Chains in Outer Region Connected to Core Region on Amyloidogenicity
- プラズマ重合膜を用いた化学センサー
- Plasma-Polymerized 4,4'-Methylenedianiline Membrane Formed on Platinum as Chemically Modified Electrode for pH
- Plasma-Polymerized Allylamine Film Used as a New Solid Phase in Immunoradiometric Assay (IRMA) : Effect of Antibody (F(ab')_2 Fragment) Concentration on Dose Response in Two-Site IRMA
- フタロシアニンプラズマ重合膜への有機化合物の吸着
- Latex Piezoelectric Immunoassay : Detection of Agglutination of Antibody-Bearing Latex Using a Piezoelectric Quartz Crystal
- Effects of Annealing Conditions and Substrate Materials on the Superconducting Properties of Ba_2YCu_3O_ Films Prepared by the Dipping-Pyrolysis Process at 750℃
- Preparation of Superconducting Ba_2YCu_3O_ Films by the Dipping-Pyrolysis Process at 700° and 750℃
- Effects of Heat Treatment Conditions on the Critical Current Densities of Ba_2YCu_3O_ Films Prepared by the Dipping-Pyrolysis Process
- Low-k SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor