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Nanyang Technological University, School of Electrical and Electronic Engineering | 論文
- Self-Heating Induced Germanium Outdiffusion and Non-Local Channel Degradation in the Strained-Si/SiGe N-MOSFET subjected to Channel Hot-Electron Stress
- Study of Trap Generation in the Sc_2O_3/La_2O_3/SiO_x Gate Dielectric Stack by Scanning Tunneling Microscopy