スポンサーリンク
NTT Advanced Technology Corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0124, Japan | 論文
- Water-Soluble Barrier Material for Three-Layer Resist Systems
- Spin Coating Film Transfer and Hot-Pressing System for Uniform Dielectric Formation and Its Application to Porous Low-$k$ Film Formation
- Peel-Off Characteristics at Interface between Base Film and Dielectrics with Spin-Coating Film Transfer and Hot-Pressing Technology
- Evaluation of Critical-Point Behavior of Fluoro-Compounds
- Metalorganic Vapor Phase Epitaxy Growth of InAlAsSb on InP
- Metal–Organic Vapor Phase Epitaxy of GaN and InGaN Using Triethylamine with Ammonia as a Nitrogen Source