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Microprocessing Research Lab. School Of Chemical Engineering College Of Engineering Seoul National U | 論文
- A Study on Therlnal Stability of CoSi_2 Elnploying Novel Flne-Gralned PolycryStalline Silicon/CoSi_2/Si (001) System : Semiconductors
- W as a Bit Line Interconnection in Capacitor-Over-Bit-line (COB) Structured Dynamic Random Access Memory (DRAM) and Feasible Diffusion Barrier Layer
- Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
- Reduction of junction leakage current and sheet resistance using C-49 TiSi_2 as a diffusion source
- Formation of Low-Resistivity Gate Electrode Suitable for the Future Devices Using Clustered DCS-Wsix Polycide
- Structural Evaluation of CVD WSix and Its Effect on Polycide Line Resistance
- W as a BIT Line Interconnection in COB Structured DRAM and Feasible Diffusion Barrier Layer