スポンサーリンク
Microelectronics Laboratories, NEC Corp. | 論文
- Selective Epitaxial Growth of Si and Si_Ge_x Films by Ultrahigh-Vacuum Chemical Vapor Deposition Using Si_2H_6 and GeH_4
- Temperature Dependence of Etching with Molecular Fluorine on Si(111) Surface
- Photoluminescence of Si_Ge_x/Si Quantum Well Structures
- SiGe Passivation for Si MBE Regrowth