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Materials and Devices Research Labs., Research and Development Center, Toshiba Corporation | 論文
- MCFC電解質板におけるリチウムアルミネ-トの相変化に関する検討
- Heteroepitaxial TiN Film Growth on Si (111) by Low Energy Reactive Ion Beam Epitaxy
- Heteroepitaxial TiN Films Growm by Reactive Ion Beam Epitaxy at Room Temperature