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Kobe Steel Ltd. Kobe Jpn | 論文
- Impact of Thermal Nitridation on Microscopic Stress-Induced Leakage Current in Sub-10-nm Silicon Dioxides
- Photoemission Study on Protonic Conductor CaZrO_3:Evidence of the Exchange Mechanism of Proton and Hole
- Repetitive One-Tenth Micron Pattern Fabrication Using An EB Block Exposure System
- Electron Beam Block Exposure System for 256 M Dynamic Random Access Memory Lithography
- High-Quality CVD/Thermal Stacked Gate Oxide Films with Hydrogen-Free CVD SiO_2 Formed in a SiCl_4-N_2O System
- Kinetic Study of Silicon Nitride Growth from Dichlorosilane and Ammonia
- CF_X (X=1-3) Radical Measurements in ECR Etching Plasma Employing C_4F_8 Gas by Infrared Diode Laser Absorption Spectroscopy
- Electronic Structure of Bi_4Ti_3O_ Thin Film by Soft-X-Ray Emission Spectroscopy
- Uniformity Improvement of Optical and Electrical Characteristics in Integrated Vertical-to-Surface Transmission Electro-Photonic Device with a Vertical Cavity
- Record Low Threshold Current in Microcavity Surface-Emitting Laser
- High-Resolution Frequency-Modulation Atomic Force Microscopy in Liquids Using Electrostatic Excitation Method
- Low Resistance NiAuGe/Au Ohmic Contacts on N-Type (111)A GaAs
- Growth Kinetics of Hybridoma Cells in High Density Culture
- Liquid Crystalline Behaviors of Conducting Polyacetylene Derivative with Mesogenic Substituent and Its Mixture with Ferroelectric Liquid Crystal
- Thermal Cracking Effects of CeCl_3 Dopant on Blue Electroluminescent Properties in SrGa_2S_4:Ce Thin Films
- Ce-Activated SrS Thin Film Electroluminescent Devices Fabricated by Multi Source Deposition Using Ga_2S_3 Precursor
- Dependence on Ce Concentration of Blue Emission and Crystallographic Properties in SrGa_2S_4:Electroluminescent Thin Films Grown by Molecular Beam Epitaxy
- Theoretical Analysis of Photoacoustic Displacement for Inhomogeneous Materials
- A New Method of Photothermal Displacement Measurement by Laser Interferometric Probe : Its Mechanism and Applications to Evaluation of Lattice Damage in Semiconductors
- Phenylalanine Production by Periodic Induction of Gene Expression Using a Temperature-Distributed Dual Fermenter System