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Institute for Semiconductor Technologies, ULVAC Inc., Susono, Shizuoka 410-1231, Japan | 論文

• Reactive Ion Etching Process of Transition-Metal Oxide for Resistance Random Access Memory Device
• Dry Etching Process for Pb(Zr,Ti)O3 Thin-Film Actuators
• Performance of Integrated Cu Gap-Filling Process with Chemical Vapor Deposition Cobalt Liner (Special Issue : Advanced Metallization for ULSI Applications)

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