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Institute Of Acvanced Material Study And Department Of Molecular Science And Technology Graduate Sch | 論文
- A Novel Degydrative Ring-Transformation of 1-Alkyl-3-aroypyrrolidenes into 1-Alkyl-2-aryl-3-methylpyrroles
- Electronic State Distributions of He(ns, np, nd) Rydberg States Produced from Three-Body Collisional Radiative Recombination of He^+ in a Helium Flowing Afterglow
- Formation of CO(d^3Δ_i, a'^3Σ^+) by Dissociative Ion-Ion Neutralization Reaction
- Formation of the He_(c, d, e, f, C, D, E, F) States by Ion-Ion Neutralization Reaction of He_2^1 with C_6F_6^- in the Helium Flowing Afterglow
- Dissociative Excitation of CH_4 via Triplet Superexcited State by Collisions with the Metastable Ne(^3P_)Atoms in a Neon Flowing Afterglow
- Formation of the He(3s, 3p, 3d)States by Ion-Ion Neutralization Reaction of He^+ with C_6F_6^- in the Helium Flowing Afterglow
- Emission Spectum of NeAr_2^+ Cluster Ion Produced in the Flowing Afterglow
- Emission Spectra of HeAr_n^+(n=1-3) Cluster Ions Produced from the Helium Afterglow Reactions of Ar
- Mass-Spectrometric Study on Ion-Molecule Reactions of CF^+_3 with Propyne, Allene, and 1-Butyne at Near-Thermal Energies
- Chemical Ionization Mass Spectra of Benzene and Toluene at Low CH_4 Pressures
- Mass-Spectrometric Study on Ion-Molecule Reactions of CF_3^+ with PhX (X = F, Cl, Br, I) at Near-Thermal Energies
- A Chemical Dry Etching of Si and SiO_2 Substrates by F atoms in a Discharge Flow
- Decomposition of CO_2 into CO and O in a Microwave-Excited Discharge Flow of CO_2/He or CO_2/Ar Mixtures
- Superior Decomposition of N_2O into N_2 and O_2 in a Fast Discharge Flow of N_2O/He or N_2O/Ar Mixtures
- Electronic-State Distributions of Ne^* Formed by Energy Transfer from He(2^1S, 2^3S)to Ne at Thermal Energy
- Evaluation of Transannular Interaction in [2.3]Metacyclophanes
- SiO_2 Film Growth from ArF Laser Photolysis of Si_2H_6 and N_2O in a Perpendicular Irradiation Configuration
- Deposition of SiO_2 Films from ArF Laser Photolysis of Si_2H_6/N_2O Mixtures in a Parallel Irradiation Configuration
- Deposition of SiO_2 Thin Films by Reactive Excimer Laser Ablation
- Deposition of SiO_2 Films from ArF Laser Photolysis of SiH_4/N_2O Mixtures
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