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Fujitsu Ltd. | 論文
- 22pZA-3 高機能電子顕微鏡による準結晶構造の研究
- Magnetic Nanodot Array Formation by Exfoliation of Sputter-Deposited Magnetic Thin Films
- 22pXB-9 電子顕微鏡による Si 中 As 注入領域の観察法の検討 II
- 22aXB-3 統計的動力学理論の電子回折への適用
- 収束電子回析法による点群・空間郡の決定
- DOUBLE MAMMOS : 3-DIMENSIONAL MO RECORDING : 3D-MO NATIONAL PROJECT(Magneto-Optical Readout Method)
- 25aWY-7 収束電子回折法によるAgNbO_3室温相の空間群決定(25aWY 酸化物系,領域10(誘電体格子欠陥,X線・粒子線フォノン))
- Chemical Modification of Multi-walled Carbon Nanotubes (MWNTs) By Vacuum Ultraviolet (VUV) Irradiation Dry Process
- Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes
- Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects
- Influence of Growth Mode of Carbon Nanotubes on Physical Properties for Multiwalled Carbon Nanotube Films Grown by Catalystic Chemical Vapor Deposition
- Carbon nanotube technologies for future ULSI via interconnects
- Mechanical Polishing Technique for Carbon Nanotube Interconnects in ULSIs
- Simultaneous Formation of Multiwall Carbon Nanotubes and their End-Bonded Ohmic Contacts to Ti Electrodes for Future ULSI Interconnects
- A Multi-Stage 60GHz CMOS LNA Using Dual Noise-Matching Technique
- Automatically-Controlled C-Band Wavelength Conversion with Constant Output Power Based on Four-Wave Mixing in SOA's(Lasers, Quantum Electronics)
- Temperature-Insensitive Eye-Opening under 10-Gb/s Modulation of 1.3-μm P-Doped Quantum-Dot Lasers without Current Adjustments
- Realization of Low CoSi_2/p^+-Silicon Contact Resistance with Low Junction Leakage Current and Junction Capacitance Using Laser Thermal Process
- The Effects of Tungsten-Halogen Lamp Annealing on a Selectively Doped GaAs/N-AlGaAs Heterostructure Grown by MBE
- 23aWJ-11 収束電子回折法によるSmBaMn_2O_6電荷軌道秩序相の結晶構造解析(23aWJ Mn酸化物1,領域8(強相関系:高温超伝導,強相関f電子系など))