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Department of Physics, National Kaohsiung Normal University | 論文
- Thermal Stability of Amorphous-like WN_x/W Bilayered Diffusion Barrier for Chemical Vapor Deposited-Tungsten/p^+-Si Contact System
- Suppression of Fluorine Impurity in Blanket Chemical Vapor Deposited Tungsten Film for Via Fills with A Novel Two-step Deposition Technique
- The Characteristics of Chemical Vapor Deposited Amorphous-like Tungsten Film as a Gate Electrode