スポンサーリンク
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon 440-746, Korea | 論文
- A Study of Electrical Damage to a-Si:H Thin Film Transistor during Plasma Ashing by a Pin-to-Plate Type Atmospheric Pressure Plasma
- The Effect of N_2 Flow Rate in He/O_2/N_2 on the Characteristics of Large Area Pin-to-Plate Dielectric Barrier Discharge
- A Study of Electrical Damage to a-Si:H Thin Film Transistor during Plasma Ashing by a Pin-to-Plate Type Atmospheric Pressure Plasma
- The Effect of N2 Flow Rate in He/O2/N2 on the Characteristics of Large Area Pin-to-Plate Dielectric Barrier Discharge