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Department of Applied physics, Faculty of Engineering, University of Tokyo | 論文
- Structural Analysis of the NiSi_2/(111)Si Interface by the X-Ray Standing-Wave Method
- Nuclear Resonant Excitation of ^Dy and ^Eu by Synchrotron Radiation
- Characterization of Sb Atomic-Layer-Doped Si(100) Crystal by X-Ray Standing Wave Method
- High Frequency Time Modulation of Neutrons by LiNO_3 Crystals with Surface Acoustic Waves Excited under the Diffraction Condition
- Neutron Diffraction from a LiNbO_3 Crystal with Excited Surface Acoustic Waves
- Precise and Easy Method of TDR to Obtain Dielectric Relaxation Spectra in GHz Region
- Application of Time Domain Reflectometry Covering a Wide Frequency Range to the Dielectric Study of Polymer Solutions
- Image Analysis of Electron Micrographs of ATPase (Coupling Factor TF_1) from Thermophilic Bacteria and Luminal Epithelium of Mouse Urinary Bladder(STRUCTURE OF MEMBRANE PROTEINS)
- Anomalous Hydrodynamic Behavior of Smectic Liquid Crystals at Low Frequencies
- Apparatus for Measurement of Complex Shear Modulus of Liquid Crystals at Low Frequencies : Physical Acoustics
- Design and Evaluation of Monoclonal Antibody-Antitumor Agent Conjugate
- Effect of the Soft X-Ray Standing Wave Fields on the Total Electron Yield Spectra from an InP Crystal
- Auger Electron Emission from Gold Deposited on Silicon (111) Surface
- A Multiple Crystal System for High Strain-Sensitivity X-Ray Topography and Its Applications
- Photoluminescence Characterization of High-Purify Synthesized Diamond
- Amino Acid Residue Substitution at T-Cell Determinant-flanking Sites in β-Lactoglobulin Modulates Antigen Presentation to T Cells through Subtle Conformational Change(Food & Nutrition Science)
- Observations on Equal-Inclination Interference Fringes from a Thin Crystal of Silicon Using Nearly Parallel X-Ray Beam
- A Generalized Phase Space Optical Analysis of X-Ray Optical Systems Using Crystal Monochromators : REFINED SPECTROSCOPY, X-RAY OPTICS AND INSTRUMENTATION
- Variation of Bragg-Case Diffraction Curves of X-Rays from a Thin Silicon Crystal with Crystal Thickness
- A Dispersive Method of Measuring Extended X-Ray Absorption Fine Structure