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Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo University | 論文
- Effects of Ar Dilution and Exciting Frequency on Absolute Density and Translational Temperature of Si Atom in Very High Frequency-Capacitively Coupled SiH_4 Plasmas
- New Computed Tomography Algorithm of Electrostatic Force Microscopy Based on the Singular Value Decomposition Combined with the Discrete Fourier Transform
- Simulated Computed Tomography for the Reconstruction of Vacancies Using an Atomic Force Microscope Image
- Feasibility Study on a Novel Type of Computerized Tomography Based on Scanning Probe Microscope
- Low-Coherence Interferometry-Based Non-Contact Temperature Monitoring of a Silicon Water and Chamber Parts during Plasma Etching
- Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4 Plasmas
- Inactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma
- Feature Profiles on Plasma Etch of Organic Films by a Temporal Control of Radical Densities and Real-Time Monitoring of Substrate Temperature
- Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry