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Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And | 論文
- Novel Molecular Resist Based on Derivative of Cholic Acid
- Postexposure Delay Effect in Chemically Amplified Resists
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Adhesion-promoted Copolymers for l93-nm Photoresists without Cross-linking during Lithographic Process