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Clariant Corp. Nj Usa | 論文
- 193 nm Resists for Deep Sub-Wavelength Applications
- Evaluation of High Temperature Tensile and Creep Properties of Light Water Reactor Coolant Piping Materials for Severe Accident Analyses
- Effect of Microstructure on Failure Behavior of Light Water Reactor Coolant Piping under Severe Accident Conditions
- New Resin Systems for 157nm Lithography
- Layer-Specific Resists or l93-nm Lithography
- Materials and Resists for 193 and 157nm Applications
- New Fluorinated Resins for 157 nm Lithography Application
- Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
- Theoretical Basis for a New Development Rate Model for Positive Photoresist