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Association Of Super-advanced Electronics Technologies (aset):(present Address)advanced Technology R | 論文
- Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System
- CF and CF_2 Radical Densities in 13.56-MHz CHF_3/Ar Inductively Coupled Plasma(Nuclear Science, Plasmas, and Electric Discharges)
- Atomic-Layer Chemical-Vapor-Deposition of SiO_2 by Cyclic Exposures of CH_3OSi(NCO)_3 and H_2O_2