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琉球大学 医学部感染病態制御学 | 論文
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- Epidemiology of primary biliary cirrhosis among women with elevated γ-glutamyl transpeptidase levels in Okinawa, Japan
- EFFICACY OF HIGH-LEVEL DISINFECTANTS FOR GASTROINTESTINAL ENDOSCOPE DISINFECTION AGAINST STRONGYLOIDES STERCORALIS
- Nanometer-Scale Layer Removal of Aluminum and Polystyrene Surfaces by Ultrasonic Scratching ( Scanning Tunneling Microscopy)
- Alcoholic liver cirrhosis complicated with torsade de pointes during plasma exchange and hemodiafiltration
- Monitoring low level hepatitis B virus by a newly developed sensitive test
- A rare association of primary biliary cirrhosis and pernicious anemia
- Whipple's Disease : the First Japanese Case Diagnosed by Electron Microscopy and Polymerase Chain Reaction
- Successful Long-term Treatment with Cyclosporin A in Protein Losing Gastroenteropathy
- A Patient with Primary Biliary Cirrhosis Complicated with Slowly Progressive Insulin-dependent Diabetes Mellitus
- ENDOSCOPIC BAND LIGATION FOR POSTPOLYPECTOMY GASTRIC BLEEDING
- Correlation between serum transaminase activity and virus load among patients with chronic liver disease type B
- A patient with primary biliary cirrhosis associated with autoimmune hemolytic anemia
- Performance of serological typing of hepatitis C virus (HCV) in patients who have cleared HCV-RNA from their serum
- Prevalence and clinical features of hepatitis delta virus infectior in the Miyako Islands, Okinawa, Japan
- Relation between Reactivity to the NS-4 Region Peptides of Hepatitis C Virus (HCV) and Clinical Featurse among Patients Infected with HCV Genotype 1b
- Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels
- High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100nm Proximity X-Ray Lithography : Instrumentation, Measurement, and Fabrication Technology
- Evaluation of Overlay Accuracy for 100-nm Ground Rule in Proximity X-Ray Lithography