丸山 大介 | 京都大学大学院アジア・アフリカ地域研究研究科:(現)日本学術振興会
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概要
論文 | ランダム
- Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography
- Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head
- Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer
- Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions
- Improvement of Imprinted Pattern Uniformity Using Sapphire Mold