Izawa Masaru | Kasado Design and Production Division, Hitachi High-Technologies Corporation, Kudamatsu, Yamaguchi 744-0002, Japan

スポンサーリンク

概要

関連著者

Tamura Hitoshi
Research & Development Center Stanley Electric Co. Ltd.
Maeda Kenji
Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
Obama Shinji
Kasado Design and Production Division, Hitachi High-Technologies Corporation, Kudamatsu, Yamaguchi 744-0002, Japan
Miya Go
Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan
Izawa Masaru
Kasado Design and Production Division, Hitachi High-Technologies Corporation, Kudamatsu, Yamaguchi 744-0002, Japan

著作論文

Study on the Distribution Control of Etching Rate and Critical Dimensions in Microwave Electron Cyclotron Resonance Plasmas for the Next Generation 450 mm Wafer Processing (Special Issue : Dry Process)

スポンサーリンク