Morikawa Ryusuke | Precision and Intelligence Laboratory, Tokyo Institute of Technology,

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Precision and Intelligence Laboratory, Tokyo Institute of Technology, | 論文

• Ferroelectric Properties of BaMgF4 Films Grown on Si(100), (111), and Pt(111)/SiO2/Si(100) Structures
• Plasma Characterization in Chlorine-Based Reactive Ion Beam Etching and Chemically Assisted Ion Beam Etching
• Quality Improvement of GaInNAs/GaAs Quantum Well Growth by Metalorganic Chemical Vapor Deposition Using Tertiarybutylarsine
• Ultrasonic Transducer Array for Structural Intensity Measurements

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