KANG H. | Pohang University of Science and Technology, Department of Electrical Engineering
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- Pohang University of Science and Technology, Department of Electrical Engineeringの論文著者
Pohang University of Science and Technology, Department of Electrical Engineering | 論文
- Effects of Hydrogen and Deuterium Annealing on Plasma Process-Induced Damages
- Effects of Segregated Ge on Electrical Properties of SiO_2/SiGe Interface
- Effects of Hydrogen and Deuterium Annealing on Plasma Process Induced Damages