Chang Edward | Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan
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- 同名の論文著者
- Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwanの論文著者
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan | 論文
- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111)
- Effect of Growth Temperature on Formation of Amorphous Nitride Interlayer between AlN and Si(111) (Special Issue : Recent Advances in Nitride Semiconductors)
- Band Alignment Parameters of Al
- Band Alignment Parameters of Al₂O₃/InSb Metal-Oxide-Semiconductor Structure and Their Modification with Oxide Deposition Temperatures
- Band Alignment Parameters of Al2O3/InSb Metal-Oxide-Semiconductor Structure and Their Modification with Oxide Deposition Temperatures