Kwon G. | Department of Electrophysics, Kwongwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul 139-701, Korea
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概要
- Kwon G. C.の詳細を見る
- 同名の論文著者
- Department of Electrophysics, Kwongwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul 139-701, Koreaの論文著者
関連著者
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KWON G.
Department of Micro System Engineering, Nagoya University
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Kwon G.
Department of Electrophysics, Kwongwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul 139-701, Korea
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CHANG H.
Department of Materials Science and Engineering, Kwangju Institute of Science and Technology
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FUKUDA T.
Center for Cooperative Research in Advanced Science and Technology, Nagoya University
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Tsukahara Y.
Its Development Dept. R&d Div. R&d Center Tokairika Co. Ltd.
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Itoigawa K.
Its Development Dept. R&d Div. R&d Center Tokairika Co. Ltd.
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ARAI F.
Department of Micro System Engineering, Nagoya University
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Kim H.
Jusung Engineering Co., Ltd., Etcher Team, #49 Neungpyeong-ri, Opo-eup, Gwangju, Gyeonggi 464-890, Korea
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Bai K.
Memory Division, Semiconductor Business, Samsung Electronics, San #16 Banwol-ri, Taean-eup, Hwasung, Gyeonggi 445-701, Korea
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Kim J.
Jusung Engineering Co., Ltd., Etcher Team, #49 Neungpyeong-ri, Opo-eup, Gwangju, Gyeonggi 464-890, Korea
著作論文
- Micro Active Touch Sensor made by Hydrothermal Method
- Highly Selective SiO2 Etching in Low-Electron-Temperature Inductively Coupled Plasma