Morita Toshiaki | Hitachi Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan
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Hitachi Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan | 論文
- Filling 80-nm-Wide and High-Aspect-Ratio Trench with Pulse Wave Copper Electroplating and Observation of the Microstructure
- A Void Free Soldering Process in Large-Area, High Power Insulated Gate Bipolar Transistor Modules