Huang Chi-Hsien | Institute of Fluid Science, Tohoku University, Sendai 980-8577, Japan
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- Institute of Fluid Science, Tohoku University, Sendai 980-8577, Japanの論文著者
Institute of Fluid Science, Tohoku University, Sendai 980-8577, Japan | 論文
- Effect of Driving Frequency on the Electron Energy Probability Function of Capacitively Coupled Argon Plasmas Comparison between Simulation and Experiment
- Self-Consistent Particle Modeling of Inductively Coupled CF4 Plasmas: Effect of Wafer Biasing
- Direct Fabrication of Uniform and High Density Sub-10-nm Etching Mask Using Ferritin Molecules on Si and GaAs Surface for Actual Quantum-Dot Superlattice
- Imprinting Bias Stress in Functional Composites
- Frequency Component Analysis of Back-Reflected Surface Acoustic Wave on Diamond-Coated Silicon