Miyashita Toshihiko | Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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- Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japanの論文著者
Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan | 論文
- Potential of and Issues with Multiple-Stressor Technology in High-Performance 45 nm Generation Devices
- Design and Optimization of Gate Sidewall Spacers to Achieve 45 nm Ground Rule for High-Performance Applications