Tee Kian-Meng | Department of Technology Development, Chartered Semiconductor Manufacturing Ltd, 60 Woodlands Industrial Park D St.2, Singapore 738406, Republic of Singapore
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- Department of Technology Development, Chartered Semiconductor Manufacturing Ltd, 60 Woodlands Industrial Park D St.2, Singapore 738406, Republic of Singaporeの論文著者
Department of Technology Development, Chartered Semiconductor Manufacturing Ltd, 60 Woodlands Industrial Park D St.2, Singapore 738406, Republic of Singapore | 論文
- Enhanced Hot-Hole Induced Degradation of Strained p-Channel Metal Oxide Semiconductor Transistors in Complementary Metal Oxide Semiconductor Technology with 2.0 nm Gate Oxide
- Effective Channel Length Shortening and Mobility Increase of p-Channel Metal Oxide Semiconductor Transistors Resulting in Higher Drive Current Using Short Source–Drain Diffusion Length