Toshifumi Watanabe | NTT Microsystem Integration Laboratories, NTT corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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- NTT Microsystem Integration Laboratories, NTT corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japanの論文著者
NTT Microsystem Integration Laboratories, NTT corporation, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan | 論文
- Thick-Dielectric Formation and MOSFET Reliability with Spin-Coating Film Transfer and Hot-Pressing Technique for Seamless Integration Technology
- Compact and Polarization-Independent Variable Optical Attenuator Based on a Silicon Wire Waveguide with a Carrier Injection Structure
- A Sealing Technique for Stacking MEMS on LSI Using Spin-Coating Film Transfer and Hot Pressing
- Characterization of Air-Gap Sealing with Organic Dielectric Using Spin-Coating Film Transfer and Hot-Pressing Technology
- Spin Coating Film Transfer and Hot-Pressing System for Uniform Dielectric Formation and Its Application to Porous Low-$k$ Film Formation