Kojima Akihiro | Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, Yokohama 235-8522, Japan
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- Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, Yokohama 235-8522, Japanの論文著者
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, Yokohama 235-8522, Japan | 論文
- Sub-45 nm SiO2 Etching with Stacked-Mask Process Using High-Bias-Frequency Dual-Frequency-Superimposed RF Capacitively Coupled Plasma
- Application of HfSiON to Deep-Trench Capacitors of Sub-45-nm-Node Embedded Dynamic Random-Access Memory
- Modeling and Simulation of Arsenic-Doped-Silicon Low-Pressure Chemical Vapor Deposition